Abstract
Optical probes of surfaces have the virtue of being applicable in ambient conditions which preclude use of the conventional tools of surface science. In particular, in situ studies of surface properties during the important processes of ion bombardment and material deposition cannot generally be performed with the standard techniques. In this paper we describe measurements of the ordering of Si(111) –7×7 surfaces during the course of Ar+ ion bombardment and the room-temperature deposition of atomic Si.
© 1985 Optical Society of America
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