Various applications of local laser-driven pyrolytic reactions in the fabrication and restructuring of planar silicon-based integrated circuits have recently been reported.1-3 This method of using visible laser-driven micron-scale thermal processes to deposit locally dope or etch materials may prove to be a competitive approach in some aspects of producing highly integrated customized circuits and in repairing circuits. Recent advances in this area will be reviewed.

© 1984 Optical Society of America

PDF Article


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription