Abstract

Various applications of local laser-driven pyrolytic reactions in the fabrication and restructuring of planar silicon-based integrated circuits have recently been reported.^1-3 This method of using visible laser-driven micron-scale thermal processes to deposit locally dope or etch materials may prove to be a competitive approach in some aspects of producing highly integrated customized circuits and in repairing circuits. Recent advances in this area will be reviewed.

© 1984 Optical Society of America