Abstract

The deposition rate in laser chemical vapor deposition (LCVD) is a function of a large number of variables including the effect of the laser-generated surface temperature, local reactant concentration, substrate characteristics, and reaction kinetics. To deconvolve some of these parameters, the deposition rate as a function of irradiation time was measured optically for metal film LCVD on quartz substrates using a CO2 laser as the deposition source and a collinear He-Ne laser as the thickness monitor.

© 1984 Optical Society of America

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