Abstract

Metal photodeposition is a local low-temperature thin-film growth process which enables maskless repairing and customization of integrated circuits. Although many of these applications require the writing of good quality conductors, there have been no previous studies of the effect of the deposition conditions on the electrical properties of photodeposited metal lines. Here we report the investigation of the electrical resistivity of photodeposited metal lines under different process parameters.

© 1984 Optical Society of America

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