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Nonlinear refractive index at 351 nm by direct measurement and modeling of small-scale self-focusing

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Abstract

We have measured the nonlinear refractive index n2) in fused silica at 351 nm by a technique substantially different from those used heretofore for quantitative measurements at any wavelength. This technique stems from work by Bliss et al 1 in 1974 and involves the strong transfer of energy among different spatial frequencies In the highly nonlinear regime of self-focusing.

© 1983 Optical Society of America

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