Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Characterization and Integration of Photosensitive As2S3 Thin Layers in Optical Filters

Not Accessible

Your library or personal account may give you access

Abstract

Photosensitivity of As2S3 thin films exposed at 470 nm is studied. Large thickness change up to 8.3% and refractive index change reaching to 0.1 are demonstrated. Integration of such material in optical filters are shown.

© 2018 The Author(s)

PDF Article
More Like This
Photosensitivity of As2S3 thin films at 1.5 µm

Nicolas Hô, Jacques M. Laniel, Réal Vallée, and Alain Villeneuve
MD24 Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides (BGPP) 2003

Optical characterization of Er:As2S3 glass

S. Q. Gu, Q. Xu, S. Ramachandran, E. E. Reuter, J. T. Verdeyen, and S. G. Bishop
CThI29 Conference on Lasers and Electro-Optics (CLEO:S&I) 1994

Self-written waveguides in As2S3 thin films by two-photon absorption

Chiara Meneghini and Alain Villeneuve
QWG6 European Quantum Electronics Conference (EQEC) 1998

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.