Abstract
There are different methods for producing channel planar waveguides in silica based glasses: for example, the Ion Exchange technique [1], the Chemical Vapour Deposition techniques (as PECVD [2], FHD [3]) followed by the RIE (Reactive Ion Etching) and/or UV writing through a photolithographic mask [4], which is commercially developed, and by the direct UV writing of waveguides [5].
© 1999 Optical Society of America
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