Controllable Ring Diffraction Patterns on Silicon Induced by Bubble-Scattered Femtosecond Laser Pulses in Liquid

S. A. Romashevskiy; S. I. Ashitkov

doi:10.1364/ASSL.2020.JTh2A.1

Laser Congress 2020 (ASSL, LAC)
OSA Technical Digest (Optica Publishing Group, 2020),
paper JTh2A.1
•https://doi.org/10.1364/ASSL.2020.JTh2A.1

Controllable Ring Diffraction Patterns on Silicon Induced by Bubble-Scattered Femtosecond Laser Pulses in Liquid

S. A. Romashevskiy and S. I. Ashitkov

Advanced Solid State Lasers 2020

Washington, D.C. United States
13–16 October 2020
ISBN: 978-1-943580-84-2

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Joint Poster Session II (JTh2A)

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S. A. Romashevskiy and S. I. Ashitkov, "Controllable Ring Diffraction Patterns on Silicon Induced by Bubble-Scattered Femtosecond Laser Pulses in Liquid," in Laser Congress 2020 (ASSL, LAC), P. Schunemann, C. Saraceno, S. Mirov, S. Taccheo, J. Nilsson, A. Petersen, D. Mordaunt, and J. Trbola, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper JTh2A.1.

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Abstract

We report on producing circular ripple patterns of controlled geometry on silicon in liquid using a pair of femtosecond laser pulses. Such patterns occur by diffraction of the second pulse by the bubble, generated near the surface by the first pulse.

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