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Optical Parametric Oscillator Modeling with Diffraction, Depletion, and Double Refraction

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Abstract

A novel, time-dependent OPO computer simulation that includes diffraction, depletion, and double refraction is used to predict output beam characteristics of pulsed OPOs. In particular, we show that the OPO beam quality decreases as the pumping level increases. The dominant mechanism for this degradation in beam quality is depletion and regeneration of the pump in the frequency conversion process.

© 1994 Optical Society of America

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