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A Multiphysics Modeling Approach for Thermal Aberration Prediction and Control in Extreme Ultraviolet Lithography

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Abstract

In this work, we present an integrated opto-thermo-mechanical modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography. Several wavefront correction strategies, based on two different compensators, are simulated and compared.

© 2015 Optical Society of America

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