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Solution-processing metallic networks with the ultra-low sheet resistance

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Abstract

A highly conducting and transparent metallic network, on a flexible substrate is obtained by employing the self-cracking technique, combined with the metal electroplating. The self-cracking technique employs a sacrificial film, which cracks, and forms an excellent mask for a subsequent low temperature metal deposition (either vacuum or wet chemical) on an arbitrary substrate. The resulting network of ribbons can, subsequently be electroplated, which leads to a dramatic reduction of the network resistance, with minimal reduction in transmission. The corresponding figure of merit of the resulting metallic network exceeds 30,000. Such networks could be employed in high performance, high-power LED lighting system.

© 2017 Optical Society of America

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