Abstract

In this paper, we present the integration of an absorbing photonic crystal within a thin film photovoltaic solar cell. Optical simulations performed on a complete solar cell revealed that patterning the epitaxial crystalline silicon active layer as a 1D and 2D photonic crystal enabled to increase its integrated absorption by 37%abs and 68%abs between 300 nm and 1100 nm, compared to a similar but unpatterned stack. In order to fabricate such promising cells, a specific fabrication processes based on holographic lithography, inductively coupled plasma etching and reactive ion etching has been developed and implemented to obtain ultrathin patterned solar cells.

© 2011 Optical Society of America

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